WebJan 1, 2012 · Conclusion In this study, a field-plated AlGaN/GaN HEMT device has been fabricated and characterized. Measurement results revealed an output power of 25.36 dBm with a linear gain of 15.39 dB achieved for the FP-HEMT at 2 GHz when biased at V ds = 30 V. An improvement in breakdown voltage from 90 to 160 V was observed. WebA field-plate semiconductor structure includes a semiconductor substrate, a source ohmic contact, a drain ohmic contact, and a gate contact disposed over a gate region between the source...
Field plate for high-voltage field effect transistors - Google
WebSep 1, 2024 · To add a contact custom field in Lead Docket, click Manage > Custom Fields in the left hand menu. The lead custom fields are listed on this page. Click Contact … WebDesigned Field Plates are then fabricated on AlGaN/ GaN HEMT by formulating a compatible process flow incorporating steps for gate and source connected field plates as described. Contact Windows are opened in SiN passivation layer by using CF 4 /O 2 based dry etching. Bi-layer resist process is used for gate field plate lithography followed by kilcoy steel and farm supplies
p-GaN field plate for low leakage current in lateral GaN …
WebMay 7, 2024 · A focused pulsed X-ray beam is used to determine how the redistribution of the electric field by the gate-connected field plate affects single-event transient (SET) susceptibility of an AlGaN/GaN Schottky-gate HEMT on SiC. WebMar 18, 2024 · In this work, we report on the realization of SnO/β-Ga 2 O 3 heterojunction vertical diodes and lateral field-effect transistors for power electronic applications. The p-type semiconductor SnO is grown by plasma-assisted molecular beam epitaxy on n-type (100) β-Ga 2 O 3 with donor concentrations of 3 × 10 17 cm −3 for the diode devices and … WebMay 12, 2005 · A field effect transistor (FET) with novel field-plate structure relates to a Schottky gate FET structure with field plate thereon for increasing the operation voltage. The structure can eliminate surface damages of unpassivated region and degradation of the interface property of gate contacts during plasma etching of dielectric film for gate … kilcrew productions